MARC Görünümü: Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 2 new materials, processes and equipment / editors F. Roozeboom [and others]. [electronic resource] :

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Detaylı Bibliyografya
Materyal Türü:	Kitap
Dil:	İngilizce
Konular:	Gate array circuits Metal oxide semiconductors, Complementary Metal oxide semiconductors
Etiketler:	Etiketle Etiket eklenmemiş, İlk siz ekleyin!

era
format	Book
genre
geographic
id	bd4431db-cf87-4b60-b464-b3e9df8df321
isbn
issn
language	eng
physical	1 online resource (ix, 460 pages) :illustrations.
publication	– publisher: Electrochemical Society dateOfPublication: ©2006
publishDate	©2006
subjects
title	Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 2 new materials, processes and equipment / editors F. Roozeboom [and others]. [electronic resource] :
topic	Gate array circuits Metal oxide semiconductors, Complementary Metal oxide semiconductors