(2006). Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 2 new materials, processes and equipment / editors F. Roozeboom [and others]. [electronic resource].
Chicago Style (17th ed.) CitationAdvanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2 New Materials, Processes and Equipment / Editors F. Roozeboom [and Others]. [electronic Resource]. 2006.
MLA (9th ed.) CitationAdvanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2 New Materials, Processes and Equipment / Editors F. Roozeboom [and Others]. [electronic Resource]. 2006.
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