(2006). Advanced gate stack, source/drain, and channel engineering for Si-based CMOS 2 new materials, processes and equipment / editors F. Roozeboom [and others]. [electronic resource].
Цитирование в стиле Чикаго (17-е изд.)Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2 New Materials, Processes and Equipment / Editors F. Roozeboom [and Others]. [electronic Resource]. 2006.
Цитирование MLA (9-е изд.)Advanced Gate Stack, Source/drain, and Channel Engineering for Si-based CMOS 2 New Materials, Processes and Equipment / Editors F. Roozeboom [and Others]. [electronic Resource]. 2006.
Предупреждение: эти цитированмия не могут быть всегда правильны на 100%.